Search Inventory

Incrption Single-Wafer Spin Processor

  • New
Incrption Single-Wafer Spin Processor
Process CLEAN
Manufacturer RENA

Inception - Enabling the Transition from R&D to Pilot Production

• Provides process consistency to develop your POR

• Highly flexible software enables rapid process development

• Standard dual tank design provides multi-step processing

• Excellent etch uniformity even with etch rates > 100 A/sec

• Manual or automated wafer handling

• Rapid quenching etch with spin dry providing excellentparticle performance

For Compound Semi Customers:

• Low cost of ownership

• Small Footprint

• For low throughput applications

• Acid and Solvent Processes

• Integrated wafer handling capabilities that table top spinnersdo not offer

• Process performance exceeds batch systems where etchuniformity is critical in low volume applications

• 2 to 4 Chemical process tanks

• Wafers up to 200mm and masks up to 7 x 7

• A single or dual moving spray arms with separate chem lines

• Stationary bottom spray nozzles for DI and N2

• Multiple chem feeds to the back of the unit from external sources

• Dedicated drains with software controlled diverter valve

• FEoL & BEoL processing applications

CONTACT US

  • Office phone number

    03-6423-0130

    【Operating hours】 9:00~17:30
    *Excluding Saturdays, Sundays, holidays, year-end and New Year holidays, and company holidays.

  • Form website

    Contact form